http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112301219-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P10-20 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B3-409 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B23-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B7-005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B3-22 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B23-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B3-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B3-22 |
| filingDate | 2020-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-112301219-B |
| titleOfInvention | Application of Heteropolyacid as Carrier for Removing Trace Silicon and Phosphorus Impurities in Nickel Solution |
| abstract | The invention discloses an application of using a heteropoly acid as a carrier to remove trace amounts of silicon and phosphorus impurities in nickel solution. The acid is removed to achieve the purpose of impurity removal. In the removal of impurities such as Si and P in the nickel solution, obvious effects have been obtained. |
| priorityDate | 2020-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 70.