| abstract |
The invention belongs to the technical field of zinc oxide materials, in particular to a preparation method of a zinc oxide-based sputtering target material. Therefore, the preparation method has the advantages of simple process flow, easy operation and processing, etc. The prepared target material has excellent thermal shock resistance, resulting in High-density, high-density, high-strength zinc oxide ceramic targets can try to eliminate the phenomenon of no tortoise cracks on the surface of the ceramic target, sintering without pores, and the production process is simple and more suitable for mass production in the assembly line. |