http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112090890-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B08B9-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B08B9-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
| filingDate | 2020-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-07-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-112090890-B |
| titleOfInvention | Photoresist collection cup cleaning method and photoresist collection cup cleaning equipment |
| abstract | The invention discloses a photoresist collection cup cleaning method and photoresist collection cup cleaning equipment. The photoresist collection cup cleaning method includes a pre-cleaning step: activating a rotating plate located inside the photoresist collecting cup and a rotating plate located below the rotating plate The cleaning liquid nozzle is controlled, and the cleaning liquid nozzle is controlled to spray the cleaning liquid on the rotating sheet, so that the cleaning liquid is sputtered on the inner side of the photoresist collection cup by the rotating sheet, so as to pre-clean the photoresist collection cup; and the cleaning steps in different areas: The rotating plate is controlled to rotate at a variable speed for multiple times. The initial speed of each rotation is different. Each rotation causes the cleaning solution to be sputtered to an area on the photoresist collection cup. The area covered by the multiple sputtering of the cleaning solution includes at least the photoresist. Collect the part of the cup to be cleaned. This embodiment realizes sub-regional cleaning by changing the initial rotation speed, and realizes mobile cleaning for each region through variable-speed rotation, which improves the cleaning effect and avoids subsequent process defects caused by residual photoresist in the photoresist collection cup. |
| priorityDate | 2020-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 16.