| abstract |
The invention discloses a diamond and a preparation method and application thereof. The diamond preparation method includes (1) obtaining a surface that is easy to be separated from a diamond film by processing a base material of a substrate table; (2) adopting plasma The chemical vapor deposition method forms a diamond film layer on the surface of the substrate table, in which plasma chemical vapor deposition uses a variety of energy sources to couple plasma; (3) post-processing the diamond film layer to remove the impurity materials and impurities on the diamond surface. Nucleation and/or stress layers inconsistent with the bulk properties of the diamond film. The present invention realizes stable high-quality large-area diamond film by comprehensively designing the whole process, especially processing the base material of the substrate stage in the early stage, coupling of various energy sources in the deposition process, and specific post-processing preparation. The method has the advantages of controllable thickness, controllable quality and controllable cost, which lays a foundation for diamond in the fields of cutting tools and heat sinks. |