| abstract |
The present invention relates to an antireflection film, a Cauchy model, and a photocurable coating composition, the antireflection film showing the results of Fourier transform analysis of the results of X-ray reflectance measurement using Cu-Kα rays In the graph of , an extreme value is exhibited at a thickness of 35 nm to 55 nm from the surface, and an extreme value is exhibited at a thickness of 85 nm to 105 nm from the surface. The anti-reflection film can simultaneously achieve high scratch resistance and antifouling property while having low reflectivity and high light transmittance, and can also improve the screen clarity of the display device. |