| abstract |
The present invention provides a novel sulfonium salt, a novel photoacid generator, etc., the sulfonium salt has high sensitivity to i rays, and the photoacid generator is formed by containing a sulfonium salt, and the sulfonium salt has a high sensitivity to i rays Radiation has high photosensitivity, high compatibility with cationically polymerizable compounds such as epoxy compounds, and excellent storage stability in the complex. The present invention is a sulfonium salt represented by the following general formula (1), a photoacid generator and the like characterized by containing the sulfonium salt. [In formula (1), R represents an alkyl group or an aryl group, and the substituents R1 to R5 independently represent an alkyl group, a hydroxyl group, an alkoxy group, an aryl group, an aryloxy group, a hydroxy(poly)alkyleneoxy group or Halogen atom, R6 to R9 independently represent an alkyl group, an aryl group or a hydrogen atom. m1 to m5 each represent the number of R1 to R5, m1 and m4 represent an integer from 0 to 3, m2 and m5 represent an integer from 0 to 4, m3 represents an integer from 0 to 5, and X - represents a monovalent polyatomic anion] |