http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111752098-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ac7c032063aa624c4fb86e8a22fa0a20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4fdc8abc5b817141b50c3d01d185c993 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02F1-133514 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02F1-1335 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20 |
| filingDate | 2019-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_74819068fb97a32622666ecc0ff6ebc1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb49e544570c3e6e735b4e4790ea99b5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_914f6633ab8244d924f8ac0e3cd19224 |
| publicationDate | 2020-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-111752098-A |
| titleOfInvention | Self-luminous photosensitive resin composition, color filter and image display device |
| abstract | The present invention provides a self-luminous photosensitive resin composition, a color filter and an image display device. The self-luminous photosensitive resin composition includes the following components: photoluminescent quantum dot particles, photoinitiator, photopolymerizable compound and alkali-soluble resin, wherein the photoinitiator includes at least one free radical initiator and at least one Thermal acid generator. The invention provides a photo-thermal hybrid photosensitive resin composition, which can combine the advantages of two curing systems of radical photocuring and thermal curing, and has excellent response to light sources in the wavelength range of 200-500 nm , and in the post-baking process, the thermal curing characteristics can be fully exerted, so as to achieve the effect of deep curing. By using the self-luminous photosensitive resin composition of the present invention, even in thick film curing, it can be completely cured with less energy, has excellent adhesion, has good developability, and can suppress pattern undercut after development Phenomenon. |
| priorityDate | 2019-03-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 671.