http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111675720-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_f40d54888a037fd064c144d334b8bc94 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07B2200-07 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07B2200-13 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D493-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D493-04 |
| filingDate | 2020-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_25b764885e9b06558939116e8e933079 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ab05a9a0d144da564aca9f368e868284 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bacb8be2d350205fc60dce392386ab40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb6c696107f7401724c35f1e3703c2f5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9287af45b8f26223ec721fb1d16218d9 |
| publicationDate | 2020-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-111675720-A |
| titleOfInvention | A kind of trifluorosulfonamide hexahydrofuro[3,2-b]furan photoresist resin monomer and preparation method thereof |
| abstract | The invention discloses a trifluorosulfonamide hexahydrofuro[3,2-b]furan photoresist resin monomer and a preparation method thereof. The trifluorosulfonamide hexahydrofuro[3,2-b]furan The photoresist-like resin monomer includes the following general formula: Wherein, R 1 and R 2 respectively include C 1 -C 12 alkyl, heteroalkyl or connecting bond; R 3 includes hydrogen, halogen, C 1 -C 12 alkyl or heteroalkyl, and the preparation method thereof includes the following steps : The trifluorosulfonyl compound is added to the amino hexahydrofuro[3,2-b]furan alcohol compound and the alkali mixture, and the reaction is obtained to obtain a trifluorosulfonamide hexahydrofuro[3,2-b] An intermediate product of a furan alcohol structure; the intermediate product is mixed with an acrylic compound, and after esterification, the trifluorosulfonamide hexahydrofurano[3,2-b]furan-based photoresist resin monomer is obtained by purification. The trifluorosulfonamide hexahydrofuro[3,2-b]furan photoresist resin monomer synthesized by the invention has anti-swelling, alkali solubility and hydrophobicity, and the preparation method is simple and convenient. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112661805-A |
| priorityDate | 2020-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 58.