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filingDate 2020-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_63294cbb7c89a5973354f18e0c67300b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f86df6b2b2b5a569ebffe72f41092e4
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publicationDate 2020-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-111671683-A
titleOfInvention A kind of hypoallergenic agarwood moisturizing facial mask and preparation method thereof
abstract The invention provides a hypoallergenic agarwood moisturizing facial mask and a preparation method thereof, and relates to the technical fields of plant extraction and skin care products. The hypoallergenic agarwood moisturizing facial mask of the present invention comprises the following raw materials by weight percentage: agarwood hydrosol 20-50%, xanthan gum 0.5-1.5%, vitamin E 0.1-0.3%, glycerin 10-20%, 1,3-butanedi Alcohol 3-5%, betaine 0.5-1.5%, sodium hyaluronate 0.1-0.5%, β-glucan 1-3%, L-lactic acid 0.1-1%, water balance; the above-mentioned agarwood hydrosol adopts pre- Processing, extraction, molecular cleavage, distillation and other steps to extract. The agarwood facial mask of the invention has the advantages of less impurity content, good permeability and pure fragrance, and has the functions of mildness, moisturizing and relieving fatigue.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112972324-A
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type http://data.epo.org/linked-data/def/patent/Publication

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