| abstract |
Method and apparatus for surface treatment of substrates. The present invention relates to a method for the surface treatment of an at least predominantly crystalline substrate surface (1o, 1o') of a substrate (1, 1') such that through the substrate surface (1o, 1o) ') at the substrate surface (1o, 1o') to form an amorphous layer (2, 2', 2") wherein the amorphous layer (2, 2', 2") has a thickness d >0 nm. Furthermore, the invention relates to a corresponding device. |