abstract |
The present invention is a polishing pad containing a polyurethane resin foam, the polishing pad has a polishing surface, the polishing surface is composed of the surface of the polyurethane resin foam, and the polyurethane resin foam is at 30°C. The tanδ is 0.10 to 0.50, and the average value of the bubble diameter is 50 to 120 μm. |