http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111518561-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30608 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30604 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
| filingDate | 2020-01-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-111518561-B |
| titleOfInvention | Silicon etchant and application thereof |
| abstract | The invention relates to a silicon etchant with high silicon/silicon dioxide etching selectivity ratio and application thereof. The silicon etchant comprises at least one ketal compound and at least one quaternary ammonium hydroxide, wherein the ketal compound accounts for 20-99 wt% of the total weight of the silicon etchant, and the quaternary ammonium hydroxide accounts for 0.1-10 wt%. |
| priorityDate | 2019-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 48.