http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111499381-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3206 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6567 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6562 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-96 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-5445 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-3225 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6581 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-608 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-404 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3414 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-6268 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-622 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-488 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-645 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-488 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-645 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-626 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-622 |
| filingDate | 2020-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-04-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-111499381-B |
| titleOfInvention | Preparation method of high-compactness conductive zirconia ceramic target for magnetron sputtering |
| abstract | The invention discloses a preparation method of a high-compactness conductive zirconia ceramic target material for magnetron sputtering, which comprises the following steps: doping and pretreating zirconia powder to obtain stable tetragonal crystal form powder; carrying out atmosphere sintering treatment on the powder to obtain conductive zirconia powder; conducting primary pressing molding on the conductive powder through isostatic pressing equipment according to the size of a die to obtain a rough blank; loading the rough blank into a graphite mold, then loading the graphite mold into a vacuum hot-pressing sintering furnace for sintering, and after sintering, carrying out stepped temperature reduction, pressure relief and discharging to obtain a rough target; and finally, performing finish machining to obtain the high-compactness conductive zirconia ceramic target special for magnetron sputtering. The preparation method disclosed by the invention is simple in preparation process, easy to operate, safe and pollution-free, and the prepared zirconia target material is good in conductivity, compactness and stability, completely meets the requirements of the target material for the magnetron sputtering process, and provides a reliable guarantee for realizing industrialized coating. |
| priorityDate | 2020-04-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 53.