| abstract |
The present invention provides a composition for forming a protective film resistant to a wet etching solution for semiconductors, comprising: a compound containing at least one acetal structure in a molecule, or a polymer thereof; and a solvent, which is a light source in semiconductor manufacturing In the etching process, a composition for forming a protective film having excellent resistance to a wet etching solution for semiconductors, a method for producing a resist patterned substrate to which the protective film is applied, and a method for producing a semiconductor device are provided. |