| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_45f314dc7bf9134fbbd14f50866c720e |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31055
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 |
| filingDate |
2018-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6773398f3459ebbe19c496fe3b905daa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6756627d44d2a97c4f82dc5972d59f27
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9203b702ceea514d9033485c7a9a04c4
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2af1e466dbf93279f6450107836b23a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3e96b0154baa85dffc3040296872f66a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f339a475f161db00237500b1f90cb6ed |
| publicationDate |
2020-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-111378380-A |
| titleOfInvention |
A chemical mechanical polishing liquid and its application |
| abstract |
The invention provides a chemical mechanical polishing liquid, which comprises silica abrasive particles and a nitrogen-containing heterocyclic compound containing one or more carboxyl groups. The polishing liquid of the present invention has higher polishing rates of silicon nitride and silicon dioxide at the same time. |
| priorityDate |
2018-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |