http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111362702-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-96 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-656 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-658 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6567 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-571 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B38-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y70-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B33Y10-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-622 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C64-124 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B38-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-622 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B33Y70-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C64-124 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C04B35-571 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B33Y10-00 |
| filingDate | 2020-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-111362702-B |
| titleOfInvention | Preparation method of SiOC radar type wave-absorbing material |
| abstract | The invention discloses a preparation method of an SiOC radar type wave-absorbing material, which comprises the following steps: adding polymethylsilsesquioxane, methacryloxypropyltrimethoxysilane and an anhydrous solvent into a reaction vessel, stirring at room temperature until the polymethylsilsesquioxane, the methacryloxypropyltrimethoxysilane and the anhydrous solvent are completely dissolved, adding deionized water and concentrated hydrochloric acid, and continuously stirring for reaction to obtain a transparent solution; distilling the transparent solution under reduced pressure to obtain transparent polysiloxane resin; adding a polyfunctional group reactive diluent into the polysiloxane resin, stirring, and adding a photoinitiator into the mixture for reaction to prepare the polysiloxane resin for direct writing forming; placing polysiloxane resin for direct-writing forming in a charging barrel of a direct-writing forming device, extruding and superposing layer by layer, and adding UV (ultraviolet) photocuring assistance on a slurry deposition platform until additive manufacturing of the whole three-dimensional structure is completed; and calcining the three-dimensional structure at high temperature to prepare the SiOC ceramic material with radar wave absorption performance. The invention has the advantages of high manufacturing efficiency, low cost and simple post-treatment. |
| priorityDate | 2020-03-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 54.