| abstract |
The present disclosure provides a method for preparing a multilayer structure, including the following steps. A substrate with a patterned layer is placed in a reactor. A first metal precursor is introduced into the reactor. A first excess metal precursor is purged from the reactor. A first reactant is introduced into the reactor, wherein the first reactant and the first metal precursor react with each other to form a first metal-containing layer on the pattern layer. A first excess reactant is purged from the reactor. A second metal precursor is introduced into the reactor, wherein the second metal precursor is adsorbed on the first metal-containing layer. A second excess metal precursor is purged from the reactor. A second reactant is introduced into the reactor, wherein the second reactant and the second metal precursor react with each other to form a second metal-containing layer on the first metal-containing layer. |