http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111285954-B

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F214-26
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F2-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F214-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F214-18
filingDate 2020-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-111285954-B
titleOfInvention Preparation method of high molecular weight modified polytetrafluoroethylene dispersion resin and dispersion concentrated solution
abstract The invention provides a preparation method of high molecular weight modified polytetrafluoroethylene dispersion resin and a dispersion concentrated solution. Adding a stabilizer, a dispersant, a pH regulator and a modifier into an aqueous medium, introducing a tetrafluoroethylene monomer, adding persulfate to initiate a polymerization reaction, and adding a free radical polymerization inhibitor when the reaction reaches a specified amount of the tetrafluoroethylene monomer; after the reaction is finished, collecting the modified polytetrafluoroethylene dispersion liquid, and obtaining high molecular weight modified polytetrafluoroethylene dispersion resin through coagulation, washing and drying; or concentrating the collected modified polytetrafluoroethylene dispersion liquid to obtain a high molecular weight modified polytetrafluoroethylene dispersion concentrated liquid. The polytetrafluoroethylene dispersion resin prepared by the invention has high molecular weight and narrow molecular weight distribution, is applied to paste extrusion to prepare porous materials, and the obtained porous materials have low environmental load, high breaking strength and good homogeneity; the obtained modified polytetrafluoroethylene concentrated solution has high thermal stability, aging resistance and radiation resistance.
priorityDate 2020-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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