http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111105982-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F3-1121 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J49-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F3-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B22F1-107 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F3-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J49-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F1-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J49-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B22F3-22 |
| filingDate | 2019-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-111105982-B |
| titleOfInvention | Preparation method of film type porous ion source |
| abstract | The invention discloses a preparation method of a film type porous ion source, which comprises the steps of raw material mixing, source piece preparation, sintering and sample coating, wherein the raw material mixing is to fully mix rhenium powder and platinum powder uniformly, add liquid glue to stir uniformly and stand under the natural environment condition to form a uniform mixture. The preparation of the source wafer is that firstly, a diluent is added into a mixture of rhenium powder, platinum powder and liquid glue prepared in the step of mixing raw materials, the mixture is fully stirred into a uniform slurry gelatinized mixture, then the mixture is poured into a mold with a flat bottom surface, so that the mixture forms a flat film in the mold, and the flat film is cut into the source wafer after natural drying. The invention realizes the mixing of the rhenium powder and the platinum powder by using the liquid glue under the condition of natural environment temperature, avoids the uniformity problem of the rhenium powder and the platinum powder in the ion source, and simplifies the corresponding treatment process flow. Meanwhile, a flat plate natural film forming mode is adopted, so that the thickness of the film is ensured to be consistent, the thickness control of the film can be realized, and the ionization efficiency of the nuclide to be analyzed is higher and more stable. |
| priorityDate | 2019-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.