http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111072691-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_907d2f2f4fbab25e94a90711294aeed4 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-012 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B5-223 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0085 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G02B1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B1-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F3-06 |
| filingDate | 2019-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bfd4b41bc63551d934cd6a5e1b840f0b |
| publicationDate | 2020-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-111072691-A |
| titleOfInvention | A kind of photoresist material and preparation method thereof, color filter substrate |
| abstract | The present application discloses a photoresist material, a preparation method thereof, and a color filter substrate. The photoresist material includes an oligomer segment, and its chemical structural formula is: Among them, the value of n ranges from 1 to 2. The beneficial effects of the present invention lie in that the photoresist material and the preparation method thereof, the color filter substrate of the present invention connect the dye with the oligomer segment to form a photoresist material with heat resistance, and at the same time, the oligomer segment can be dispersed through the interval of the oligomer segment. The dye molecules can improve the solubility of the photoresist material and achieve the effect of further solubilization. The color filter substrate using the photoresist material as a raw material can prepare a color filter with high contrast and high transmittance. |
| priorityDate | 2019-12-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 49.