http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111052331-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-30148 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-20084 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-10061 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T2207-20081 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-0004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-0006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-001 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67288 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-9501 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-12 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66 |
| filingDate | 2018-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-111052331-B |
| titleOfInvention | System and method for identifying disturbances in detected defects and defects of interest |
| abstract | The present invention provides methods and systems for identifying disturbances and DOIs of defects in defects detected on a wafer. A method includes acquiring metrology data for the wafer generated by a metrology tool performing measurements on the wafer at an array of measurement points. In one embodiment, the measurement point is determined prior to detection of the defect on the wafer and independently of the defect detected on the wafer. The method also includes determining a location of the detected defect on the wafer relative to a location of the measurement point on the wafer, and determining the detected defect based on the location relative to the measurement point. the location of the defect to assign metrology data to the defect as defect attributes. Additionally, the method includes determining whether the defect is a disturbance or a DOI based on the defect attribute assigned to the defect. |
| priorityDate | 2017-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID65028 http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419534785 |
Total number of triples: 22.