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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F297-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41N1-12
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F297-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41N1-12
filingDate 2018-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2023-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2023-01-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-111051373-B
titleOfInvention Block copolymer for photosensitive printing plate excellent in abrasion resistance and production method
abstract An object of the present application is to provide a flexographic printing plate having moderate elasticity (softness) and improved abrasion resistance required for a flexographic printing plate. This application relates to a block copolymer for photosensitive printing plates, which consists of at least two polymer blocks mainly composed of aromatic vinyl monomers and at least one polymer block mainly composed of conjugated diene monomers Block structure, the content of the aromatic vinyl monomer introduced into the polymer block mainly composed of the conjugated diene block is equal to the total bonded aromatic vinyl monomer in the block copolymer 25 to 50% by weight of the content.
priorityDate 2017-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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