http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111041533-B
Outgoing Links
Predicate | Object |
---|---|
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76898 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76879 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-12 |
filingDate | 2019-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2021-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2021-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-111041533-B |
titleOfInvention | Electroplating solution for electroplating pure cobalt and application thereof |
abstract | The invention provides an electroplating solution for electroplating pure cobalt and application thereof, wherein the electroplating solution for electroplating pure cobalt comprises the following components: a base solution, which is an aqueous solution of a soluble cobalt salt; a complexing agent comprising a conjugated oxime group. According to the electroplating solution for electroplating pure cobalt, the complexing agent of the conjugated oxime group is used, so that the strong cathode polarization effect is achieved on the electrochemical deposition of cobalt ions, the deposition rate of cobalt can be controlled, the cobalt can be uniformly nucleated and grown, a high-quality pure cobalt coating is obtained, and the electrical interconnection is achieved. |
priorityDate | 2019-12-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 50.