http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110872696-B

Outgoing Links

Predicate Object
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-5873
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-36
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D9-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-58
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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-36
filingDate 2018-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-06-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-110872696-B
titleOfInvention Logo deplating process
abstract The invention provides a Logo deplating process, which comprises the following steps: firstly, putting a product into a deplating solution A to soak and deplate oxides on the surface of a PVD (physical vapor deposition) film layer; secondly, putting the product into a deplating liquid B to soak and deplate the PVD film layer; thirdly, putting the product into a deplating solution C to soak and deplate the protective printing ink; fourthly, cleaning the soaked product to obtain a deplated product; the deplating liquid A comprises the following components in percentage by mass: 10-20% of inorganic base, 1-2% of carbonate, 1-3% of auxiliary agent and the balance of water. The plating removing process achieves good plating removing effect and can realize automatic operation, so that the yield of products is kept about 88%; the deplating liquid A, B and C has low temperature and short deplating time when deplating the product, thereby being convenient for saving energy, reducing operation risk and improving deplating efficiency.
priorityDate 2018-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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