http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110769618-B

Outgoing Links

Predicate Object
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-072
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-423
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-42
filingDate 2019-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2021-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-110769618-B
titleOfInvention Method for plating copper in PCB hole
abstract The invention relates to the technical field of PCB processing technology, in particular to a method for plating copper in a PCB hole, which comprises the following steps: (1) drilling: selecting a substrate according to design specifications and carrying out drilling treatment; (2) polishing; (3) carrying out sand blasting (4) and carrying out juvenile grinding; (5) removing glue; (6) copper deposition: placing the substrate inCarrying out copper deposition treatment in the copper deposition liquid medicine, wherein the copper deposition rate is 40-60U', and the Cu content of the copper deposition liquid medicine is Cu 2+ The concentration of NaOH, HCHO and EDTA is 1.7-2.3g/L, 6-10g/L, 1.9-4.6g/L and 27-43g/L in sequence; (7) drying; (8) VCP electroplating of copper. According to the invention, after the copper deposition rate and the concentration of the liquid medicine components of the copper deposition process are optimized, the abnormal problems of foaming, breakage and the like at the bottom of the hole are effectively solved, the effect is obvious, and the method is easy to industrialize.
priorityDate 2019-11-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID7855
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID16211228
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID409152720
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419474364
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419527198
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID409060395
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6581
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID8846
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23978
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419554224
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453149268
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID66357
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6049
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID962
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID62655
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID17318
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448151759
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425322952
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID418354341
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419512635
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID4093
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID450174003
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID407932856
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID453694953
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14798
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID122600
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID408057983
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID413832638
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425901710
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415733947
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID88798
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID712
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID10176082
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24412

Total number of triples: 45.