http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110554174-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2039b54b822838146a7ad6fa46147080 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N33-497 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N33-497 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-00 |
filingDate | 2019-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_765ad77ae4295b3f3b46fbb579bf9158 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b516935a0ea7e84ff58ba1e6176ad49a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_297d0a97429438a4463c732348e7f49c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e9db94cfe9c5222eff62cee41e946fe5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4ec4a37ca8b69694635a8192c91ff751 |
publicationDate | 2019-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-110554174-A |
titleOfInvention | Sensor for detecting exhaled gas |
abstract | The invention discloses a sensor for detecting exhaled gas, which comprises a shell, wherein a gas suction device and a circuit board are arranged in a cavity, gas to be detected is sucked into the cavity from a gas inlet on the shell through the gas suction port of the gas suction device, the sensor device comprises a silicon wafer, a metal oxide material is coated on an electrode of the silicon wafer, the metal oxide material is a tin oxide nanosheet-shaped material synthesized by adopting a monoatomic palladium-loaded tin oxide nanomaterial through a hydrothermal method, surface defects are obtained through etching, finally, the monoatomic palladium-loaded tin oxide nanosheet is obtained through impregnation and reduction, and a heating device is further arranged on the electrode of the silicon wafer. According to the invention, the metal oxide material is a tin oxide nanosheet material synthesized by adopting a monoatomic palladium-supported tin oxide nanomaterial by a hydrothermal method, surface defects are obtained by etching, and finally the monoatomic palladium-supported tin oxide nanomaterial is obtained by dipping and reduction, so that the selectivity and the sensitivity are high. |
priorityDate | 2019-08-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.