http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110527827-A

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B34-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C22B3-02
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B3-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C22B34-22
filingDate 2019-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d30e77e59e748c047a20b5a4e31af02a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_14e189619d05c327e447c49ae6bd5067
publicationDate 2019-12-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-110527827-A
titleOfInvention A kind of vanadium slag continous way Leaching Vanadium solution containment
abstract The invention discloses a kind of vanadium slag continous way Leaching Vanadium solution containments, belong to metal smelt technical field.Including rotating cylinder, the outer rim of rotating cylinder is equipped with rotation support component, rotates the outer rim of the rotating cylinder of the side of support component equipped with the driving assembly for driving rotating cylinder to rotate;One side end of rotating cylinder is equipped with discharge port, the inside of rotating cylinder is equipped with cavity, central shaft is axially arranged on cavity inside edge, several spaced baffles are equipped in the cavity, and the via hole being set in the central shaft is offered in the middle part of the baffle, it is sequentially increased as the aperture of the direction far from discharge port to the via hole on baffle described in discharge port direction, the diameter for separating out the aperture ratio central shaft for the via hole that the farthest baffle of material mouth is equipped with is big.The device is continuously leached using acid adding, which continuously leaches to be continuously added acid in each leaching stirred tank, and constantly mixing is until complete Leach reaction.The device process is simple, and the reaction time is fast.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112593097-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-112797754-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113088687-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113088687-B
priorityDate 2019-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 29.