http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110511424-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-10 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M50-403 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M50-414 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M50-491 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M50-489 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08J9-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B29C41-24 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L79-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M50-489 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M50-491 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M50-423 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M50-403 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C41-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08J9-26 |
| filingDate | 2015-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-02-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-110511424-B |
| titleOfInvention | Imide-based resin film manufacturing system and imide-based resin film manufacturing method |
| abstract | The present application relates to an imide-based resin film manufacturing system and an imide-based resin film manufacturing method. The present invention can efficiently manufacture a high-quality imide-based resin film excellent in porosity. The imide-based resin film production system of the present invention includes a film forming unit (70) that removes fine particles from the fired film to form a porous resin film, the film forming unit (70). The fired film is obtained by firing a resin material containing polyamic acid, polyimide, polyamideimide or polyamide, and an unfired film of fine particles; and a chemical etching unit (40), The chemical etching unit (40) dissolves a part of the porous resin film. |
| priorityDate | 2014-06-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 170.