http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110508260-B

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J20-24
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filingDate 2019-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-110508260-B
titleOfInvention Preparation method of lead ion imprinted composite hollow microspheres
abstract The invention provides a preparation method of a lead ion imprinted composite hollow microsphere, which comprises the following steps: preparing polyurethane microsphere grafted polyacrylic acid by utilizing polyurethane and acrylic acid; preparing hollow silica microspheres; preparing chitosan grafted polyacrylic acid; adding the chitosan grafted polyacrylic acid into distilled water, dissolving, adding modified silicon dioxide hollow microspheres, uniformly dispersing, and adjusting the pH value to 13 to obtain SiO 2 Chitosan grafted polyacrylic acid composite hollow microspheres; using the SiO 2 Preparing the lead ion imprinting composite hollow microsphere by grafting the chitosan and the polyacrylic acid composite hollow microsphere. The invention has the advantages that: 1. taking polyurethane microspheres as a template, hydrolyzing tetraethyl orthosilicate on the surface of the polyurethane microspheres, and removing the polymer template to obtain SiO 2 Hollow microspheres; 2. loading chitosan grafted acrylic acid on SiO 2 On hollow microspheres, SiO is utilized 2 The chemical stability and the large specific surface area of the material greatly improve the stability and the specific surface area of the material in the solution and improve the recycling efficiency of the material.
priorityDate 2019-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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