| abstract |
The present invention provides a photosensitive radiation-sensitive or radiation-sensitive resin composition, a resist film, a pattern forming method, and a photosensitive radiation-sensitive or radiation-sensitive resin composition, a resist film, a patterning method, which can be applied as a mask and can form a pattern having excellent crack resistance and etching resistance during etching. Methods of manufacturing electronic devices. The photosensitive radiation-sensitive or radiation-sensitive resin composition is a photosensitive radiation-sensitive or radiation-sensitive resin composition containing a resin and having a solid content concentration of 10% by mass or more, and the resin includes: A repeating unit A derived from a monomer having a transition temperature of 50°C or lower; and a repeating unit B having an acid-decomposable group, the content of the repeating unit B is 20 mol % or less relative to all repeating units in the resin, and the resin is At least one of the repeating units it has is a repeating unit having an aromatic ring. |