| abstract |
In a first aspect, a method is provided comprising: (a) coating a curable composition onto a substrate; (b) coating a hardmask composition over the curable composition; (c) coating A layer of a photoresist composition is coated over the hardmask composition, wherein one or more of the compositions can be removed by an ashless process. In a second aspect, a method is provided comprising: (a) coating an organic composition onto a substrate; (b) coating a photoresist composition layer over the organic composition; wherein the organic The composition comprises a material capable of generating alkali soluble groups upon heat treatment and/or radiation treatment. The invention also provides a related composition. |