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filingDate 2018-01-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-05-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-110291611-B
titleOfInvention Plasma abatement technology using water vapor and oxygen reagents
abstract Embodiments of the present disclosure relate to systems and techniques for abatement of F-gas present in effluents of semiconductor fabrication processes. In one embodiment, a water and oxygen delivery system for a plasma abatement system is provided. The water and oxygen delivery system includes a housing including a floor and a plurality of side walls, the floor and the plurality of side walls defining an enclosed area. The water and oxygen delivery system further comprises a cylindrical water tank, the cylindrical water tank being positioned on the base plate, wherein the longitudinal axis of the cylindrical water tank is parallel to the plane defined by the base plate, and the length of the water tank is 1.5 times or more the diameter of the cylindrical water tank . The water and oxygen delivery system further includes a flow control system positioned above the cylindrical water tank within the housing.
priorityDate 2017-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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