| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c8401bd1a86a10d5508942a53475fc38 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-58 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D401-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G73-0627
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D213-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D7-123 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D7-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D7-00 |
| filingDate |
2018-01-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b3bfca89ddb5e4f42a3ac906ebc1dd7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07b07d1ec930a136b82257c1465ca30b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6f9f84caa48be31817fbffdfd6968daa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c0fe5de5ce04ca4d2fd4d760d8b7865c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c2ad1c3ad155342e38849d635d60ffc7 |
| publicationDate |
2019-09-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-110268101-A |
| titleOfInvention |
Pyridinium salt compound, its synthesis method, metal or metal alloy electroplating bath comprising said pyridinium salt compound, and the use method of said metal or metal alloy electroplating bath |
| abstract |
The present invention relates to pyridinium salt compounds, synthetic methods for their preparation, metal or metal alloy electroplating baths containing said pyridinium salt compounds, and methods of using said metal or metal alloy electroplating baths. The electroplating bath is particularly suitable for filling recessed structures in the electronics and semiconductor industries, including dual damascene applications. |
| priorityDate |
2017-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |