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filingDate 2013-03-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ec623191561c267d04dbda5f30cd66c
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publicationDate 2019-09-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-110246941-A
titleOfInvention Light-emitting devices grown on silicon substrates
abstract A method according to an embodiment of the present invention includes growing a semiconductor structure on a substrate comprising silicon. The semiconductor substrate includes an aluminum-containing layer in direct contact with the substrate, and a III-nitride light-emitting layer disposed between the n-type region and the p-type region. The method also includes removing the substrate. After removal of the substrate, a transparent material is formed in direct contact with the aluminum-containing layer. Transparent materials are textured.
priorityDate 2012-03-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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