| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F2438-03 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2018-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate |
2022-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-110178084-B |
| titleOfInvention |
Photoresist composition and photoresist film using the same |
| abstract |
The present invention relates to a photoresist composition and a photoresist film using the same, the photoresist composition capable of forming a photoresist composition in which it is highly photosensitive during formation of a fine pattern on a metal surface substrate while suppressing a footing phenomenon patterns, and can produce photoresist films with excellent chemical stability. |
| priorityDate |
2017-11-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |