http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110176074-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_64c08dbbd66b52c9a43aa3682ae4aafe http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_b90539083256b2ac0551fc9b8029e61d |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06T17-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G06T17-30 |
| filingDate | 2019-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_386ff63f5c3b5c437dbc7ec3170fa85c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2469f7ae771e7bb533ebfcc1900776ea http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ce45fe38f9a1972a77e5f939c26ad2ba |
| publicationDate | 2019-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-110176074-A |
| titleOfInvention | Rapid Modeling Method of Bas-relief Model Based on Equi-Geometric Collocation Method |
| abstract | The invention discloses a rapid modeling method of a bas-relief model based on an equi-geometric collocation method. If the equi-geometric collocation method can be applied to the modeling of the bas-relief model, the modeling efficiency of the bas-relief model can be improved. The steps of the present invention are as follows: parametrically process the image to obtain the parametric result in the form of a spline; use Greville coordinates to collocate the parameterized result, and the set of all collocated points is recorded as a collocated point set; The conditional Poisson equation is used to obtain the base surface model; the set of feature points and the constraint values of the feature points are defined; the Poisson equation with Dirichlet boundary conditions added to the constraint values of feature points is solved by the equi-geometric collocation method, and the bas-relief model is obtained. The present invention adopts isogeometric analysis based on the collocation method, and the points selected are far less than the Galerkin method, so the calculation speed is far superior to the Galerkin method. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110751665-A |
| priorityDate | 2019-05-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
| Predicate | Subject |
|---|---|
| isDiscussedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426106964 http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6436605 |
Total number of triples: 19.