http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110133966-A

Outgoing Links

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filingDate 2019-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_af506911f987eedacecd76963682fcdc
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publicationDate 2019-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-110133966-A
titleOfInvention Photoresist coating device
abstract A photoresist coating device, comprising a cavity base, a cavity body, and a cavity top cover, the cavity base, the cavity body and the cavity top cover constitute a coating chamber; the coating sputtering area is located in the The inner wall of the cavity top cover, and the material coating the sputtering area is a hydrophilic wetting material. The hydrophilic material can reduce the contact angle between the liquid and the surface of the hydrophilic material, so that the liquid is not easy to stick to the sputtering area of the coating, and the fluidity of the liquid is increased; when the coating process is performed, due to The mixed liquid flying out due to centrifugal force reaches the coating sputtering area, which is easier to flow and discharge, avoids accumulation and reduces back splashing, thereby improving the working efficiency of the coating device.
priorityDate 2019-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
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Total number of triples: 17.