http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110054594-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-3142 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G2261-1422 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G61-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D265-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D265-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D498-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D498-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D498-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-56 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D265-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D498-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D498-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D265-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G61-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D498-04 |
| filingDate | 2019-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-07-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-110054594-B |
| titleOfInvention | Resist underlayer film monomer, resist underlayer film composition and pattern forming method |
| abstract | The invention belongs to the field of photoetching, and particularly relates to a resist lower layer film monomer, a composition and a pattern forming method. The resist lower layer film composition contains a resist lower layer film monomer with a structure shown in a formula (1), an aromatic polymer and a solvent; in the formula (1), X is an oxygen atom, a sulfur atom or two independent hydrogen atoms; m at different positions is each independently 0 or 1; r 1 And R 2 Each independently is hydrogen, C 1 ‑C 8 Alkyl, substituted or unsubstituted phenyl of (a); r 3 ‑R 6 Each independently a hydrogen atom, a straight-chain, branched, monocyclic or polycyclic unsaturated group having 1 to 10 carbon atoms with or without heteroatoms; r 3 And R 4 、R 5 And R 6 Can be selectively connected independently of each other to form a ring shape. The resist underlayer film composition provided by the invention has high etching resistance and heat resistance. |
| priorityDate | 2019-05-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 59.