| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51ba5eb073bd4bbbe0dcb23cce1966ce |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E60-10 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C01B33-025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01M4-386
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01M4-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C01B33-025 |
| filingDate |
2019-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5432ebd3d24d859ccf3ec6c48e23ef29
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5e613586515c4a36dc92236013b9a2ef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_71661766f839df371543524fd82e3e5b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_80e26474cc2bb5849914a2068d7b6882
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d866fcbbe8a76a605f64418e0448b4e5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5815edeef3e1e2d1c90d5f3c4b3d9e85
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e6ee4a5606a0b47063565cbd79f9c89 |
| publicationDate |
2019-07-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
CN-110040734-A |
| titleOfInvention |
A kind of nano silicon and preparation method thereof |
| abstract |
The invention discloses a nano-silicon and a preparation method thereof, wherein the method comprises the steps of: mixing silicon dioxide powder and graphene powder and performing first sintering in an inert atmosphere or a purification atmosphere to obtain a first sintered product; The first pickling and the first oxidizing treatment are performed on the first sintered product to obtain an intermediate product; the intermediate product is mixed with silicon dioxide powder and sintered for the second time under an inert atmosphere or a purification atmosphere to obtain an intermediate product. The second sintered product; after the second sintered product is pulverized and subjected to the second pickling treatment, nano-silicon is prepared. The nano-silicon preparation method provided by the invention has simple process, low quality requirements on raw materials, and low cost; and the nano-silicon prepared by the invention has the characteristics of extremely high purity (99.99%) and uniform particle size. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115196642-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-115196642-B |
| priorityDate |
2019-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |