| abstract |
The present application relates to a method for producing a polymer film. The present application is a production method capable of efficiently forming a polymer film containing highly aligned block copolymers on a substrate without orientation defects, coordination number defects, distance defects, and the like, and can provide a method for producing a polymer film capable of being effectively applied to the production of various patterned substrates and a method for producing a patterned substrate using the polymer film. |