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filingDate 2018-12-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2022-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-110010680-B
titleOfInvention Semiconductor device and semiconductor structure
abstract The embodiment of the invention provides a semiconductor device and a semiconductor structure, wherein the semiconductor device comprises a substrate, a first III-V group compound layer, a second III-V group compound layer, a source electrode, a drain electrode and a grid electrode stacking structure; a first III-V compound layer disposed on the substrate; a second III-V compound layer disposed on the first III-V compound layer; a source and a drain disposed on opposite lateral boundaries of the second III-V compound layer; the grid stacking structure is arranged on the second III-V group compound layer and comprises a first grid and a second grid, and the first grid is arranged on the second III-V group compound layer; the second grid is arranged on the first grid and electrically insulated from the first grid, and the second grid is electrically coupled to the source. The semiconductor device can reduce the leakage current of the semiconductor device.
priorityDate 2017-12-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 53.