http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109935512-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F16K31-0675 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32192 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F16K51-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F16K31-0603 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F16K31-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32266 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3461 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67 |
| filingDate | 2018-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2021-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2021-12-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-109935512-B |
| titleOfInvention | Plasma processing apparatus |
| abstract | The invention provides a plasma processing apparatus, which can stably supply processing gas and precursor gas to a processing chamber. A plasma processing apparatus of the present invention includes: a processing chamber for performing plasma processing on the sample; a high-frequency power supply for supplying high-frequency power for generating plasma; a sample stage on which the sample is placed; and a gas supply unit configured to supply a gas to the process chamber, the gas supply unit including: a first pipe for supplying a first gas as a gas for etching treatment to the treatment chamber; a second pipe for supplying a second gas as a gas for etching treatment to the treatment chamber; and a third pipe through which a third gas as a deposition processing gas flows and which is connected to the second pipe, wherein the second pipe is provided with a fourth valve that prevents the third gas from flowing in a direction of a supply source of the second gas. |
| priorityDate | 2017-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.