http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109917618-B

Outgoing Links

Predicate Object
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-20
filingDate 2015-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-109917618-B
titleOfInvention Method for producing photosensitive resin composition for color filter and photosensitive resin composition for color filter
abstract The invention provides a method for producing a photosensitive resin composition for a color filter and a photosensitive resin composition for a color filter, wherein the photosensitive resin composition for a color filter can be used for high-precision photoetching after pigment is dispersed in a micro-dispersion manner at a high concentration, and defects caused by the existence of foreign matters are difficult to generate. The manufacturing method comprises the following steps: a first step of dispersing (C) a pigment in a dispersion medium containing (A) a compound obtained by reacting a hydroxyl group-containing compound, which is obtained by reacting a bisphenol fluorene-based epoxy compound with a carboxylic acid containing an ethylenically unsaturated bonding group, with a cyclic acid anhydride, (B) a dispersant, and (Z) a solvent, so that the average particle diameter of the pigment is 50nm or less; a second step of blending (D) a polymerizable monomer having at least 1 ethylenically unsaturated bond and (E) a photopolymerization initiator into the dispersion obtained in the first step; and a third step of filtering the dispersion obtained in the second step, the filtration accuracy being less than the film thickness of a cured film formed from the dispersion.
priorityDate 2014-07-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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