| abstract |
The invention provides an array substrate and a manufacturing method thereof, and relates to the technical field of display. In the present invention, the first metal layer and the insulating layer are sequentially formed on the substrate, the etching barrier layer is formed on the insulating layer, and the etching barrier layer and the insulating layer are etched multiple times to form connection holes penetrating the insulating layer, and the connection holes are connected. The hole includes a plurality of via holes connected in sequence, and the slope angle of each via hole is smaller than the preset slope angle, forming a second metal layer, and the second metal layer is connected with the first metal layer through the connection holes. The etching barrier layer and the insulating layer are etched multiple times, so that the formed connection holes include a plurality of via holes connected in sequence, and because the thickness of the insulating layer etched each time is small, it is ensured that the formed connection holes are The slope angle of each via hole is smaller than the preset slope angle. When the second metal layer is subsequently fabricated, it is avoided that the second metal layer is poorly covered or disconnected due to the large slope angle of the connection hole, and the first metal layer is improved. Poor bonding with the second metal layer. |