http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109791375-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-36 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-40 |
| filingDate | 2017-07-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-08-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-109791375-B |
| titleOfInvention | Reverse pattern forming composition, method for forming reverse pattern, and method for forming device |
| abstract | [Problem] The present invention provides a composition for forming a reverse pattern using a water-based solvent that has little influence on an etching pattern, and which has good flatness and filling properties after application, and is excellent in etching resistance . Further, a method for forming a pattern using the same is provided. [Solution] A reverse pattern forming composition comprising a polysiloxane compound containing a repeating unit having a nitrogen-containing group, and a fine pattern forming method using the same, and a fine pattern forming method using the same Solvents containing water. |
| priorityDate | 2016-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 45.