http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109791355-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D221-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D221-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2018-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2022-08-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-109791355-B |
| titleOfInvention | Photoacid generator and chemically amplified positive photoresist composition for thick films comprising the same |
| abstract | The present disclosure relates to photoacid generators and chemically amplified positive photoresist compositions for thick films comprising the same. The photoacid generator can exhibit not only high solubility in the solvent of the photoresist composition, but also chemical and thermal stability and high sensitivity. Specifically, the photoacid generator generates acid through photolysis, and at the same time, can exhibit an anti-corrosion effect on the metal substrate. |
| priorityDate | 2017-09-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 109.