http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109700714-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_53e735e090aab0f663e628b4fb32a132 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-88 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61Q19-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-64 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61Q19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61Q19-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-99 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-9789 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-9728 |
| filingDate | 2019-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fe75bad0440a56b2506050866636a04c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf0596965e39010de15c943d7f0aa107 |
| publicationDate | 2019-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-109700714-A |
| titleOfInvention | A kind of reparation facial mask and preparation method thereof containing EGF and r-PGA |
| abstract | The present invention relates to cosmetic technical fields, more particularly to a kind of reparation facial mask containing EGF and r-PGA, the reparation facial mask includes following raw material: 70 ~ 90 parts of deionized water, 1,2 ~ 5 parts of 3- butanediol, 0.1 ~ 0.25 part of transparent xanthan gum, 0.01 ~ 0.03 part of EDETATE SODIUM, 0.1 ~ 0.2 part of hyaluronic acid, 0.7 ~ 1.4 part of r-PGA, 0.6 ~ 1.3 part of glycerol, 0.5 ~ 1.2 part of peony root extractive, 8 ~ 14 parts of EGF, 0.35 ~ 0.65 part of parahydroxyacet-ophenone, 0.4 ~ 0.8 part of 1,2- hexylene glycol, 0.7 ~ 1.3 part of yeast extract, 0.7 ~ 1.2 part of apple stem cell；The raw material proportioning for repairing facial mask is in range of the present invention, rapid osmotic can be carried out to skin and reaches deep layer reparation, with extraordinary instant reparation, skin and other effects of releiving, and it is good to the lasting shield of various skin problems treatment repairing effect, it is a kind of extraordinary facial mask of repairing effect. |
| priorityDate | 2019-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 43.