http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109602636-B

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filingDate 2019-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 2020-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-109602636-B
titleOfInvention Production process of preservative-free mask
abstract The invention relates to the technical field of daily cosmetics, in particular to a production process of a preservative-free mask. The preservative-free mask provided by the invention is utilized in the production process 60 Co-gamma ray irradiation can effectively kill microorganisms, ensure that the active ingredients of facial mask essence in the facial mask are not damaged, and the facial mask is stored in a dark place at room temperature for 2-3 years without deterioration or failure, overcomes the defects of incomplete sterilization, repeated operation and easy damage of the active ingredients of the traditional patch facial mask by utilizing high-pressure steam, can realize mass production and sterilization, is simple and easy to implement, and saves resources. In addition, in the preparation of the preservative-free mask, the chitosan oligosaccharide mucus fiber is processed 60 Co-gamma rays are irradiated in the irradiation dose of 3kGy-8kGy, so that the attaching property, the hygroscopicity and the softness of the mask can be improved, and the moisture absorption is promoted.
priorityDate 2019-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 39.