http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109602636-B
Outgoing Links
Predicate | Object |
---|---|
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K2800-30 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61L2-081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K8-0212 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61Q19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61Q17-005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K8-735 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K8-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K8-736 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/A61K8-64 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61Q19-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61Q17-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-73 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61L2-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/A61K8-64 |
filingDate | 2019-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate | 2020-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationDate | 2020-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | CN-109602636-B |
titleOfInvention | Production process of preservative-free mask |
abstract | The invention relates to the technical field of daily cosmetics, in particular to a production process of a preservative-free mask. The preservative-free mask provided by the invention is utilized in the production process 60 Co-gamma ray irradiation can effectively kill microorganisms, ensure that the active ingredients of facial mask essence in the facial mask are not damaged, and the facial mask is stored in a dark place at room temperature for 2-3 years without deterioration or failure, overcomes the defects of incomplete sterilization, repeated operation and easy damage of the active ingredients of the traditional patch facial mask by utilizing high-pressure steam, can realize mass production and sterilization, is simple and easy to implement, and saves resources. In addition, in the preparation of the preservative-free mask, the chitosan oligosaccharide mucus fiber is processed 60 Co-gamma rays are irradiated in the irradiation dose of 3kGy-8kGy, so that the attaching property, the hygroscopicity and the softness of the mask can be improved, and the moisture absorption is promoted. |
priorityDate | 2019-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 39.