http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109477236-B
Outgoing Links
| Predicate | Object |
|---|---|
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-2885 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-008 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-026 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-001 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D3-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D17-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-026 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D17-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D17-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D5-08 |
| filingDate | 2017-08-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2019-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 2019-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | CN-109477236-B |
| titleOfInvention | Apparatus for vertical galvanic metal deposition on substrates |
| abstract | The invention relates to a device for vertical galvanic metal, preferably copper, deposition on a substrate, said device comprising at least a first device element and a second device element, said device elements being arranged parallel to each other in a vertical manner; Wherein said first device element comprises at least one first anode element having a plurality of through conduits and at least one first carrier element having a plurality of through conduits; wherein said at least first anode element and said at least first carrier element firmly connected to each other; wherein said second device element comprises at least one first substrate holder adapted to receive at least one first substrate to be processed, wherein said at least first substrate holder is receiving The processed at least first substrate at least partially surrounds the at least first substrate along its outer frame, wherein the at least first device element further comprises a plurality of plugs, wherein each plug comprises at least one through channel, and wherein each plug is arranged in such a way that each plug extends from the backside of the at least first carrier element through a straight-through conduit of the at least first carrier element and further through the at least first a respective forward feedthrough of the anode element; and wherein all of said plugs are detachably connected to said at least first device element. Furthermore, the invention generally relates to a method for vertical galvanic metal deposition on a substrate using such a device. |
| priorityDate | 2016-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 25.