http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-109425637-A

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filingDate 2017-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_61b39d1fc56f8b8bc591fc3fca2dfca6
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publicationDate 2019-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber CN-109425637-A
titleOfInvention Modification method for improving the gas-sensing properties of silicon nanowires and its gas-sensing sensor
abstract The invention discloses a modification method for improving the gas-sensing properties of silicon nanowires and a gas-sensitive sensor thereof. First, a hydrofluoric acid aqueous solution is used to modify the surface of a silicon wafer, then metal-assisted chemical etching of the silicon nanowire is performed, and finally a double-apex electrode is formed to form a Gas sensor. In the invention, the porous silicon nanowire gas sensing sensor with the top polymerized structure is formed by the treatment of the hydrofluoric acid aqueous solution, and more conductive paths are formed between the double vertex electrodes, so that more porous silicon nanowires participate in the gas sensing reaction. Furthermore, the detection of ultra-low concentration nitrogen oxide gas at room temperature has the advantages of high sensitivity and good selectivity. The method has the advantages of simple equipment, convenient operation, good repeatability, low cost and the like, and can better realize industrial production.
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priorityDate 2017-09-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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